1 Equipment description:

1.1 Purpose: Patterned Wafer Inspection System, to monitor Patterned wafers particles and defects for yield manager.

1.2 Model: KLA-Tencor 2139

1.3 Original Manufacture Date: Feb-2001

1.4 SN: 1152

1.5 Location: Currently in Omni-Semitech Inc. cleanroom

2 System configuration:

2.1 Currently Configured for 200mm Wafer Size

2.2 Handler: 200mm Open cassette (x2)

2.3 Cassette Handling: Vacuum Handling Open Handler

2.4 Robot: Single End-Effector

2.5 Chuck Type: 200mm Vacuum

2.6 Lamp: 150W Arc Lamp

2.7 Operator Interface: Trackball and keyboard standard

N/A