● Equipment description:

1. Purpose: Laser-based, noncontact, nondestructive measurement technique for monitoring ion implantation and other processes.

2. Model: Thermawave TP500

3. Vintage: 1997

4. SN: 3730

5. Location: Currently in Omni-Semitech Inc. cleanroom

● System configuration:

1. Currently Configured for 200mm Wafer Size

2. Handler: Integrated 200mm SMIF (x2) with mini environment

3. Cassette Handling: Vacuum Handling

4. Robot: Pri/Equip Robot ATM-105

5. Chuck Type: 200mm Vacuum

6. COGNEX 3000 Pattern Recognition

7. Laser: > Diode 10mW class IIIB probe laser > Diode 70mW class IIIB pump laser

8. PC configurations: > CPU: 80486 > Memory: 3M > OS: DOS 6.22

9. Application software: IOPT/IMS 1.4a10

10. Dimensions:

> Height: 152.5 cm (60")

> Width: 177.8 cm (70")

> Depth: 145 cm (57")

> Service clearance on all sides: (36")

11. Weight:

> Instrument: ~ 936.2 kg (2064 lb)

> Handler: ~ 97.5 kg (215 lbs)

> Shipping: ~ 936.2 kg instrument + 97.5 kg handler (2064 lb instrument + 215 lb handler) 12. Facilities:

> Vacuum: 50.8-61 cm/Hg

> Power: Single Phase, 110V, 50/60 Hz

N/A