● Equipment description:

1 Purpose: Thin Film Measurement System, to monitor film thickness and optical characters (n & k).

2 Model: Therma-Wave OP5340

3 Original Manufacture Date: 2002

4 SN: 8275

5 Location: Currently in Omni-Semitech Inc. warehouse

● System configuration:

1 Currently Configured for 300mm Wafer Size

2 Cassette: 300mm FOUPs x 2 3 Cassette Handling: ASYST Front Loader with FOUPs 4 Robot: PRI ABM-405-1-S-CE, Single End-Effector

5 Chuck Type: 300mm

6 Operator Interface: Mouse and keyboard standard

7 Application software: TFMS-V4.3.9 8 Dimensions and Weight > Width: 59.9” (152cm) > Depth: 58.69” (149cm) > Height: 70.38” (179cm) > Weight: 3712 lb. (1703kg)-crate plus the machine 9 Facilities Requirements: > Power: 1 Phase 115V VAC,50/60 Hz, 10Amp > Vacuum: 20” - 24” (510 - 610 mm) Hg @ 1 SCFM > Air or N2: 85-100psi, 6.0SCFM > Exhaust Vent and Fittings: 350-400SCFM stability ±10%

● Measurement System:

1 BPR/BPE > Source: 675mn thermoelectrically cooled diode laser

2 Spectrometer/SE > Source: > Visible: 450-840nm, tungsten halogen > DUV: 190-450nm (SE: 210-450nm) deuterium source

3 Absolute Ellipsometer > Source: 633nm HeNe laser

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