●Equipment description: 

> Purpose: Thin Film Measurement System, to monitor film thickness and optical characters (n & k). 

> Model: Therma-Wave OP5240 

> Original Manufacture Date: 1999 

> SN: 8077 

> Location: Currently in Omni-Semitech Inc. warehouse

●System configuration: 

> Currently Configured for 200mm Wafer Size 

> Cassette: Open Cassette x 2 

> Cassette Handling: Vacuum Handling Open Handler 

> Robot: PRI ATM-105-1-CE, Single End-Effector 

> Chuck Type: 200mm

N/A