Equipment description:

‧Purpose: Unpatterned Surface Inspection System, to monitor:

Bare silicon wafers and bare silicon wafers with films surface particles and defects.

‧Model: KLA-Tencor SP1-TBI

‧Original Manufacture Date: December,2006

‧SN: 1006-1101

System configuration:

‧Current configured for 200mm SMIF.

‧Handler: 200mm SMIF x 2

can be configured to open cassette stations x4 as an option

‧Robot: Equip 32, Single End-Effector

‧Chuck Type: 200mm Vacuum

‧Laser: 30mW Argon Laser

‧Operator Interface: Trackball and keyboard standard

N/A