Equipment description:

‧Purpose: Patterned Wafer Inspection System,

to monitor Patterned wafers particles and defects for yield manager.

‧Model: KLA-Tencor 2135

‧Original Manufacture Date: October, 2000

‧SN: W21XX812

System configuration:

‧Currently Configured for 200mm Wafer Size

‧Cassette Handling: Vacuum Handling Open Handler

‧Chuck Type: 200mm Vacuum

‧PC configurations:

1. CPU: PII 300MHz
2. Memory: 512M
3. OS: WinNT 4.0

‧Application software: Version 5.3.038

‧Facilities:

4. Electrical 208v, 240v, 380v, 416v, 480v
5. Compressed Air 80 psi (7 Kg/cm)*
6. Connection 3/8" swagelok
7. Exhaust User Interface 8" (200 mm)@1300 CFM
8. Exhaust External fan box -14 6" (150 mm)@570 CFM
9. Exhaust E-Drawer 5" (125 mm)@325 CFM typical for 60 Hz
10. Exhaust Lamp cooling 4" (100 mm) 10 CFM

N/A